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Volume 26
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Protein Aggregation
Volume 19
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Volume 18
Reducing Costs
Volume 17
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Volume 14
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Volume 12
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Volume 9
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Volume 8
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Volume 7
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Volume 6
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Volume 5
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Volume 4
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and Inks
Volume 1
Emulsion Stability
Our newest newsletter welcomes you to download new application notes on Monitoring Protein Aggregation and Testing CMP Slurries, attend Webinars on the Importance of Refractive Index in particle sizing on May 4 and on Setting Particle Size Specifications on May 19, and to visit us at the New York Society of Cosmetic Chemists meeting in Edison, NJ May 12-13.
The study of protein aggregation encompasses a broad range of interactions and mechanisms. Many studies into this subject area investigate the aggregation of misfolded proteins, which is thought to be responsible for many degenerative diseases. Since aggregation typically leads to a physical change in protein size, particle size analysis has proven to be a useful experimental technique in this field. Dynamic light scattering (DLS) is now widely used to study protein aggregation as described in this application note.
Click to view Application Note AN178 on Monitoring Protein Aggregation Using Dynamic Light Scattering.
Testing Chemical Mechanical Polishing Slurries
Chemical mechanical polishing (or planarization) is the most popular technique for removing the surface irregularities of silicon wafers. Typical CMP slurries consist of a nano-sized abrasive dispersed in acidic or basic solution. A chemical reaction softens the material during mechanical abrasion. The abrasive particles have a size distribution which directly affects critical metrics including rate of removal and wafer defects. Particle size analysis is therefore a key indicator of CMP slurry performance. The popularity and utility of several particle sizing techniques are discussed in this application note.
Click to view Application Note AN179 on CMP Slurry Measurement Using Laser Diffraction.
Please join us for our web-based seminar (or Webinar) Monday May 4 at 1 PM EDT (10 AM PDT) on the importance and determination of refractive index (RI) when using laser diffraction. This is Part III of our Boot Camp Webinar series based on the popular customer training courses of the same name. Topics covered include:
Defining refractive index (RI)
The effect RI has on results
Options for determining RI
How to deal with the imaginary component
Attending the Webinar is easy and free of charge. We will be glad to help you understand how to attend.
Click to view the invitation to the Webinar on Refractive Index.
Webinar on Setting Rigorous and Practical Particle Size Specifications
Please join us for our web-based seminar (or Webinar) Tuesday May 19 at 1 PM EDT (10 AM PDT) on Setting Particle Size Specifications. This is an updated lecture first presented at the 2005 AAPS meeting, now including additional data and suggestions. Measuring particle size in a production and QC environment can be a monstrous task if the specifications are poorly set. This webinar aims to provide best practice guidelines using, as an example, an active pharmaceutical ingredient. Topics covered include:
When are specifications required
FDA and USP regulatory issues
Dissolution and content uniformity modeling
Method development and validation
System verification
Example and suggested specifications
Attending the Webinar is easy and free of charge. We will be glad to help you understand how to attend.
Click to view the invitation to the Webinar on Setting Particle Size Specifications.
The annual NY SCC Suppliers Day will be held Tuesday and Wednesday May 12-13 at the New Jersey Convention and Exposition Center at Raritan Center, Edison, New Jersey. HORIBA will display the state of the art LA-950 laser diffraction particle size analyzer and can discuss cosmetic applications in booth 1347. Information about the NJ Expo Center can be found at the website http://www.njexpocenter.com.
Used HORIBA Particle Size Analyzers Can Now Be Bought Through LabX
We continually receive used equipment through trade-ins and turn over of demo systems. In order to facilitate the sale of these used systems we currently have the following instruments advertised on LabX: LA-910, LA-920, and LB-500. Visit www.labx.com and search for “HORIBA particle size” to find these ads.
Masao Horiba Awards
The 2009 Masao Horiba Award Committe is now accepting applications for consideration. This year's theme for selection is "Ultrasensitive and Nondestructive Detection of Surface Contamination on Semiconductor and related Materials."
Please follow this link for more information.