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Newsletter Home

Past Issues



  • Volume 26
    Abrasives

  • Volume 25
    Drilling Fluids

  • Volume 24

    Size Specifications

  • Volume 23
    API's

  • Volume 22
    Colloidal Gold


  • Volume 21
    Cement Dispersions


  • Volume 20
    Protein Aggregation

  • Volume 19
    Pharmaceutical
    Granules


  • Volume 18
    Reducing Costs


  • Volume 17
    Liposomes


  • Volume 16
    Characterizing
    Sand


  • Volume 15
    Nanoparticles


  • Volume 14
    Nutraceuticals


  • Volume 13
    Colloids


  • Volume 12
    Metal Powders


  • Volume 11
    Polymers


  • Volume 10
    Cosmetics


  • Volume 9
    Abrasives


  • Volume 8
    Cement


  • Volume 7
    Ceramics


  • Volume 6
    Particle Shape


  • Volume 5
    Pharmaceuticals


  • Volume 4
    Formula Stability


  • Volume 3
    Road Materials


  • Volume 2
    Paint, Pigments
    and Inks


  • Volume 1
    Emulsion Stability



  • Greetings from your friends at HORIBA Instruments!

    Our newest newsletter welcomes you to download new application notes on Monitoring Protein Aggregation and Testing CMP Slurries, attend Webinars on the Importance of Refractive Index in particle sizing on May 4 and on Setting Particle Size Specifications on May 19, and to visit us at the New York Society of Cosmetic Chemists meeting in Edison, NJ May 12-13.

    Monitoring Protein Aggregation and Misfolding

    Protein Aggregation GraphThe study of protein aggregation encompasses a broad range of interactions and mechanisms. Many studies into this subject area investigate the aggregation of misfolded proteins, which is thought to be responsible for many degenerative diseases. Since aggregation typically leads to a physical change in protein size, particle size analysis has proven to be a useful experimental technique in this field. Dynamic light scattering (DLS) is now widely used to study protein aggregation as described in this application note.


    Click to view Application Note AN178 on Monitoring Protein Aggregation Using Dynamic Light Scattering.


    Testing Chemical Mechanical Polishing Slurries

    Polishing Slurries GraphChemical mechanical polishing (or planarization) is the most popular technique for removing the surface irregularities of silicon wafers. Typical CMP slurries consist of a nano-sized abrasive dispersed in acidic or basic solution. A chemical reaction softens the material during mechanical abrasion. The abrasive particles have a size distribution which directly affects critical metrics including rate of removal and wafer defects. Particle size analysis is therefore a key indicator of CMP slurry performance. The popularity and utility of several particle sizing techniques are discussed in this application note.


    Click to view Application Note AN179 on CMP Slurry Measurement Using Laser Diffraction.

    Webinar on Refractive Index

    Refractive IndexPlease join us for our web-based seminar (or Webinar) Monday May 4 at 1 PM EDT (10 AM PDT) on the importance and determination of refractive index (RI) when using laser diffraction. This is Part III of our Boot Camp Webinar series based on the popular customer training courses of the same name. Topics covered include:

    • Defining refractive index (RI)

    • The effect RI has on results

    • Options for determining RI

    • How to deal with the imaginary component

    Attending the Webinar is easy and free of charge. We will be glad to help you understand how to attend.

    Click to view the invitation to the Webinar on Refractive Index.


    Webinar on Setting Rigorous and Practical Particle Size Specifications

    Particle Size Specifications GraphPlease join us for our web-based seminar (or Webinar) Tuesday May 19 at 1 PM EDT (10 AM PDT) on Setting Particle Size Specifications. This is an updated lecture first presented at the 2005 AAPS meeting, now including additional data and suggestions. Measuring particle size in a production and QC environment can be a monstrous task if the specifications are poorly set. This webinar aims to provide best practice guidelines using, as an example, an active pharmaceutical ingredient. Topics covered include:

    • When are specifications required

    • FDA and USP regulatory issues

    • Dissolution and content uniformity modeling

    • Method development and validation

    • System verification

    • Example and suggested specifications

    Attending the Webinar is easy and free of charge. We will be glad to help you understand how to attend.


    Click to view the invitation to the Webinar on Setting Particle Size Specifications.

    Visit HORIBA at the New York Society of Cosmetic Chemists (NYSCC) Meeting

    NYSCC logoThe annual NY SCC Suppliers Day will be held Tuesday and Wednesday May 12-13 at the New Jersey Convention and Exposition Center at Raritan Center, Edison, New Jersey. HORIBA will display the state of the art LA-950 laser diffraction particle size analyzer and can discuss cosmetic applications in booth 1347. Information about the NJ Expo Center can be found at the website http://www.njexpocenter.com.

    Used HORIBA Particle Size Analyzers Can Now Be Bought Through LabX


    labX logoWe continually receive used equipment through trade-ins and turn over of demo systems. In order to facilitate the sale of these used systems we currently have the following instruments advertised on LabX:  LA-910, LA-920, and LB-500. Visit www.labx.com and search for “HORIBA particle size” to find these ads.

    Masao Horiba Awards


    Masao Horiba Awards logoThe 2009 Masao Horiba Award Committe is now accepting applications for consideration.  This year's theme for selection is "Ultrasensitive and Nondestructive Detection of Surface Contamination on Semiconductor and related Materials." 


    Please follow this link for more information.


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    Particle Size Analysis, Particle Size Distribution, Sulfur In Oil Analysis From HORIBA Instruments